SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING DEVICE,申请号KR20147021676-传众专利搜索

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发明名称	SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING DEVICE
摘要	<p>이물이 부착되고 저압의 분위기 중에 배치되는 기판을 향해 상기 저압의 분위기보다 고압의 가스를 분무해서 복수의 가스 분자로 이루어지는 클러스터를 형성하고, 해당 클러스터를 이온화하는 일 없이 상기 기판에 충돌시키는 것을 특징으로 하는 기판 세정 방법이 제공된다.</p>
申请公布号	KR101557604(B1)	申请公布日期	2015.10.05
申请号	KR20147021676	申请日期	2011.02.03
申请人		发明人
分类号	H01L21/02;H01L21/302	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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