| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide, in a measurement device for measuring the shape of an object to be inspected using a pattern projection method, a technique advantageous for reducing the size of the device, and realizing highly accurate measurement.SOLUTION: A measurement device 10 for measuring the shape of an object to be inspected includes: an emission part 2 for emitting pattern light; an optical system 3 for guiding the pattern light emitted from the emission part 2 to an object to be inspected 1; a deflection part 4 disposed between the optical system 3 and the object to be inspected 1, and for deflecting the pattern light emitted from the optical system 3; an imaging part 5 for imaging the object to be inspected 1 through the optical system 3 and the deflection part 4; and a processing part 7 for determining the shape of the object to be inspected 1 on the basis of the image of the object to be inspected 1 imaged by the imaging part 5. The deflection part 4 includes a diffraction grating 4a for diffracting the pattern light emitted from the optical system 3.</p> |
