发明名称 |
C-PARTICLE DISPERSED Pe-Pt-BASED SPUTTERING TARGET |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a sputtering target for use in deposition of a granular type thin film in a magnetic recording medium and having a high sputtering rate and a discharging stability.SOLUTION: A sintered sputtering target having a structure in which C (carbon) particles are dispersed in a parent metal composed of Fe and Pt, is provided in which a peak intensity ratio (I/I) in a microscopic Raman scattering spectrum measured on the C particles is less than 1.0 at a measurement point 2μm or more away from the interface with the mother metal, and is 1.0 or more at a measurement point 2μm or less away from the interface with the mother metal.</p> |
申请公布号 |
JP2015175025(A) |
申请公布日期 |
2015.10.05 |
申请号 |
JP20140052400 |
申请日期 |
2014.03.14 |
申请人 |
JX NIPPON MINING & METALS CORP |
发明人 |
SATO ATSUSHI |
分类号 |
C23C14/34;C22C5/04;C22C38/00;G11B5/65;G11B5/851 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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