| 摘要 |
The present invention relates to a substrate processing device. The present invention is to increase a throughput of processing a substrate by eliminating a waiting time to transfer a substrate holder. The substrate processing device comprises: a transferring device including a holding unit holding the substrate holder, and a transferring unit transferring the substrate holder held by the holding unit; and a processing chamber to process a substrate, storing the substrate held and supported by the substrate holder in order for a plate direction of the substrate to be in a vertical direction. The holding unit holds the substrate holder in a state where a plate direction of the substrate is in a horizontal direction. The transferring unit transfers the substrate holder to an upper part of the processing chamber in a state where the plate direction of the substrate is in the horizontal direction. |
