| 摘要 |
<p>The present invention manufactures a photo mask for an FPD and a device for an FPD using the photo mask by using an exposure device for lithography processes with 50% or less of reflectivity about 330nm or shorter of a wavelength among exposure light. Therefore, the present invention eliminates a separate filter for blocking exposure light of 330nm or shorter of a wavelength in an exposure device for lithography processes, thereby preventing energy features of exposure light from being lowered and preventing costs and time loss due to replacement of a filter used in the exposure device.</p> |
