发明名称 POWER SEMICONDUCTOR TRANSISTOR WITH IMPROVED GATE CHARGE
摘要 A gate power transistor with slot is a lateral power device including a substrate, a gate dielectric formed over the substrate, a channel region in the substrate below the gate dielectric, and gate electrode layer formed over the gate dielectric. The gate electrode layer overlaps the gate dielectric above the channel region, an accumulation region, and a drift region below an oxide filled shallow trench isolation (or STI) or locally oxidized silicon (LOCOS) region. The gate power transistor with slot includes one or more slots or openings on the gate electrode layer over the accumulation region. Electrical connectivity is maintained over the entire gate electrode layer without external wiring.
申请公布号 KR20150110346(A) 申请公布日期 2015.10.02
申请号 KR20150036202 申请日期 2015.03.16
申请人 KINETIC TECHNOLOGIES;SILICON FIDELITY 发明人 IRAVANI FARSHID;NILSSON JAN
分类号 H01L29/66;H01L29/78 主分类号 H01L29/66
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