REPLACEABLE UPPER CHAMBER PARTS OF PLASMA PROCESSING APPARATUS

摘要

An upper chamber section of a plasma reaction chamber includes a ceramic window with blind bores in an upper surface for receipt of a thermal couple and a resistance temperature detector, a top chamber interface which comprises an upper surface which vacuum seals against the bottom of the window and a gas injection system comprising 8 side injectors mounted in the sidewall of the top chamber interface and a gas delivery system comprising tubing which provides symmetric gas flow to the 8 injectors from a single gas feed connection.

主权项

1. A ceramic side gas injector configured to mount in any one of eight symmetrically arranged gas injector mounting holes in a side wall of a top chamber interface of a plasma reaction chamber in which semiconductor substrates can be processed, the side gas injector consisting of a stepped cylindrical ceramic body having an upstream section of larger diameter than a downstream section, and a uniform diameter central bore extending in an axial direction through axial end surfaces of the injector body.