| 摘要 |
The invention relates to a device for depositing carbonaceous structures, for example layers in the form of nanotubes or graphene on a substrate (6), which is supported by a substrate support (1) disposed in a process chamber housing (19), wherein a process gas can be fed in the direction onto the at least one substrate (6) through gas outlet openings (39) of a gas inlet element (24, 25) disposed in the process chamber housing (19). As a functionally advantageous modification, according to the invention, the process chamber housing (19) has two opposing walls (48, 48') which have holding recesses (34, 35, 36, 37, 38). At least one plate-shaped component (24, 25, 26, 30, 31) is disposed in the process chamber housing (19), which plate-shaped component has to two edge portions directed away from one another that each are inserted respectively in a holding recess (34 to 38) of one of the two walls (48, 48'). |
