| 发明名称 |
MANUFACTURING METHOD OF MASK PLATE FOR SHIELDING DURING SEALANT-CURING |
| 摘要 |
A manufacturing method of a mask plate for shielding during sealant-curing includes: forming a negative photoresist light-shielding material layer on a transparent substrate; with a color-filter mask plate set, exposing the substrate formed with the negative photoresist light-shielding material layer; developing the substrate after exposing to form the pattern of the mask plate. The method does not require separate fabrication of a mask plate, thereby significantly reducing the manufacturing costs of the mask plate for shielding during sealant-curing. |
| 申请公布号 |
US2015277226(A1) |
申请公布日期 |
2015.10.01 |
| 申请号 |
US201314361763 |
申请日期 |
2013.06.14 |
| 申请人 |
BOE TECHNOLOGY GROUP CO., LTD. ;HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. |
发明人 |
Liu Yong;Li Xiaohe;Li Hongmin;Shao Xianjie;Jiang Qinghua |
| 分类号 |
G03F7/20;G03F7/40 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A manufacturing method of a mask plate for shielding during sealant-curing, comprising:
forming a negative photoresist light-shielding material layer on a transparent substrate; exposing the substrate formed with the negative photoresist light-shielding material layer with a color-filter mask plate set; and developing the substrate after exposing to form the pattern of the mask plate. |
| 地址 |
Beijing CN |
