| 发明名称 |
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD |
| 摘要 |
A composition for pattern formation includes a block copolymer and a solvent. The block copolymer includes a group including a reactive group on at least one end of a main chain of the block copolymer. A pattern-forming method includes providing a directed self-assembling film directly or indirectly on a substrate using the composition. The directed self-assembling film includes a phase separation structure which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed. |
| 申请公布号 |
US2015277223(A1) |
申请公布日期 |
2015.10.01 |
| 申请号 |
US201514668335 |
申请日期 |
2015.03.25 |
| 申请人 |
JSR CORPORATION |
发明人 |
KOMATSU Hiroyuki;NARUOKA Takehiko;MINEGISHI Shinya;NAGAI Tomoki |
| 分类号 |
G03F7/004;G03F7/20;H01L21/027 |
主分类号 |
G03F7/004 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A composition for pattern formation comprising:
a block copolymer comprising a group comprising a reactive group on at least one end of a main chain of the block copolymer; and a solvent. |
| 地址 |
Tokyo JP |
