| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a cleaning system and a cleaning method which allow for effective removal of residual components.SOLUTION: A cleaning system includes a first supply section for supplying a first solution to a workpiece, a second supply section for supplying a second solution to the workpiece to which the first solution is supplied, a drying section for drying the workpiece to which the second solution is supplied, a container capable of maintaining an atmosphere having a pressure reduced below the atmospheric pressure, a heating section for heating the dried workpiece placed in the container, a gas supply section for supplying gas to the interior of the container, and a pressure reducing section for reducing the pressure in the container to a predetermined level.</p> |
