发明名称 |
PLATE GLASS POLISHING DEVICE AND PLATE GLASS POLISHING METHOD |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a plate glass polishing device which prevents deterioration of the polishing capability as much as possible and recovers polishing slurry S after polishing to reuse the polishing slurry S, and to provide a plate glass polishing method.SOLUTION: A plate glass polishing device includes: transfer means 10 which transfers plate glass G to which polishing slurry S composed of an abrasive compound and water adheres; an air nozzle 21 and a washing nozzle 22 which respectively jet compression air a and washing water w to the plate glass G transferred by the transfer means 10; and a shoot 31 which is disposed below the transfer means 10 and receives the polishing slurry S removed from the plate glass G by the compression air a and the washing water w jetted to the plate glass G. The air nozzle 21 and the washing nozzle 22 are disposed so that a compression air jetting position of the air nozzle 21 is located at the upstream side relative to a washing water jetting position of the washing nozzle 22 in a transfer direction. The shoot 31 is formed so as to recover the polishing slurry S dividing the slurry S into a regeneration polishing slurry Sa having high concentration of the abrasive compound and a waste polishing slurry Sb having low concentration of the abrasive compound.</p> |
申请公布号 |
JP2015171753(A) |
申请公布日期 |
2015.10.01 |
申请号 |
JP20140049291 |
申请日期 |
2014.03.12 |
申请人 |
NIPPON ELECTRIC GLASS CO LTD |
发明人 |
IWASAKI HEIWA;HAYAKAWA TOSHIFUMI |
分类号 |
B24B7/24;B24B57/02;C03C19/00 |
主分类号 |
B24B7/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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