发明名称 |
FUNCTIONAL FILM AND METHOD FOR PRODUCING FUNCTIONAL FILM |
摘要 |
The present invention addresses the problem of providing: a low-cost functional film which is free from damage on an inorganic layer or the like and stably exhibits an aimed performance; and a method for producing this functional film. The problem is solved by a functional film wherein: the retardation value of a gas barrier supporting body is 300 nm or less; the lowermost layer and the uppermost layer of an organic-inorganic laminate are inorganic layers; the difference between the linear expansion coefficient of the gas barrier supporting body and the linear expansion coefficient of a backside protective film is 0-80 ppm/°C; the melting point of a frontside protective film is 80-170°C; the adhesive force between the gas barrier supporting body and an adhesive layer is from 0.01 N/25 mm to 0.15 N/25 mm; and the adhesive force between the frontside protective film and an inorganic layer is from 0.02 N/25 mm to 0.06 N/25 mm. |
申请公布号 |
WO2015146323(A1) |
申请公布日期 |
2015.10.01 |
申请号 |
WO2015JP53618 |
申请日期 |
2015.02.10 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
SEKI TOMOKAZU;IWASE EIJIRO |
分类号 |
B32B9/00;B32B27/00;C23C16/42 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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