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发明名称
涂布薄膜之制造方法及挤压涂布装置
摘要
本发明课题系提供一种涂布薄膜之制造方法及挤压涂布装置,其减少涂布膜的宽度方向端部之厚涂部分的区域。解决手段系一种宽度方向端部会成为厚涂之涂布薄膜之制造方法,以及于制造方法所使用之挤压涂布装置;该制造方法具有藉由挤压涂布之涂布步骤:使用涂布装置10,将涂布液喷出口16A朝向支撑体22配置,并将涂布液涂布至支撑体;该涂布装置10具备透过涂布液通过的狭缝16而将涂布液从歧管喷出之涂布液喷出口16A、以及调控狭缝16的流路宽度之间隔件24;且间隔件24的涂布液喷出口侧系在流路宽度变窄的方向形成有R形状。
申请公布号
TW201536416
申请公布日期
2015.10.01
申请号
TW104102035
申请日期
2015.01.22
申请人
富士软片股份有限公司 FUJIFILM CORPORATION
发明人
山口贵志 YAMAGUCHI, TAKASHI;东良知 HIGASHI, RYOCHI;松冈明宏 MATSUOKA, AKIHIRO
分类号
B05B1/26(2006.01);B05C5/02(2006.01)
主分类号
B05B1/26(2006.01)
代理机构
代理人
丁国隆黄政诚
主权项
地址
日本 JP
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