| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of increasing a target utilization and a target life in a sputtering deposition tool.SOLUTION: In a sputtering deposition tool 100 of a type in which an ion source generates a beam directed to a sputtering target, the sputtering target includes an elongated external skirt 102 and substantially circular insert 103 positioned within the skirt 102. The surfaces of the skirt 102 and the insert 103 are relatively coplanar and form a target surface. An elongated dimension of the skirt 102 is coaxially directed to the ion source. The insert 103 is rotated within the skirt 102 to one of a plurality of positions during use of the target by the sputtering deposition tool to distribute wear of the target around the rotating insert. |
