发明名称 SEMICONDUCTOR DEVICES HAVING THROUGH ELECTRODES, METHODS OF MANUFACTURING THE SAME, AND SEMICONDUCTOR PACKAGES INCLUDING THE SAME
摘要 A semiconductor device includes a semiconductor layer having a first surface and a second surface, a through electrode penetrating the semiconductor layer and having a protruding portion that protrudes over the second surface of the semiconductor layer, a front-side bump disposed on the first surface of the semiconductor layer and electrically coupled to the through electrode, a passivation pattern including a first insulation pattern that surrounds a sidewall of the protruding portion of the through electrode and extends onto the second surface of the semiconductor layer and a second insulation pattern that covers the first insulation pattern and has an etch selectivity with respect to the first insulation pattern, and a back-side bump covering an end surface of the protruding portion of the through electrode and extending onto the passivation pattern.
申请公布号 US2015279798(A1) 申请公布日期 2015.10.01
申请号 US201414452374 申请日期 2014.08.05
申请人 SK HYNIX INC. 发明人 PARK Wan Choon
分类号 H01L23/00;H01L25/065;H01L27/118 主分类号 H01L23/00
代理机构 代理人
主权项 1. A semiconductor device comprising: a semiconductor layer having a first surface and a second surface; a through electrode penetrating the semiconductor layer and having a protruding portion that protrudes over the second surface of the semiconductor layer by a predetermined height; a front-side bump disposed over the first surface of the semiconductor layer and electrically coupled to the through electrode; a passivation pattern including a first insulation pattern that surrounds a sidewall of the protrusion of the through electrode and extends onto the second surface of the semiconductor layer and a second insulation pattern that covers the first insulation pattern and has an etch selectivity with respect to the first insulation pattern, wherein a portion of the passivation pattern under the back-side bump has a first thickness and a portion of the passivation pattern on the second surface of the semiconductor layer that does not overlap with the back-side bump has a second thickness which is less than the first thickness; and a back-side bump covering an end surface of the protruding portion of the through electrode and extending over the passivation pattern.
地址 Icheon KR