| 发明名称 |
HIGH-ASPECT-RATIO IMPRINTED STRUCTURE |
| 摘要 |
A high-aspect-ratio imprinted structure includes a first layer of cured layer material having a plurality of micro-channels imprinted in the first layer. Each micro-channel has micro-channel walls and a micro-channel bottom, the micro-channel bottom having distinct first and second portions. Deposited material is located on the micro-channel walls and not on the second portion of the micro-channel bottom. |
| 申请公布号 |
US2015276988(A1) |
申请公布日期 |
2015.10.01 |
| 申请号 |
US201414230021 |
申请日期 |
2014.03.31 |
| 申请人 |
Cok Ronald Steven |
发明人 |
Cok Ronald Steven |
| 分类号 |
G02B1/10 |
主分类号 |
G02B1/10 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A high-aspect-ratio imprinted structure, comprising:
a first layer of cured layer material having a plurality of micro-channels imprinted in the first layer, each micro-channel having micro-channel walls and a micro-channel bottom, the micro-channel bottom having distinct first and second portions; and deposited material located on the micro-channel walls and not on the second portion of the micro-channel bottom. |
| 地址 |
Rochester NY US |
