发明名称 LiCoO2 SPUTTERING TARGET, PRODUCTION METHOD THEREFOR, AND POSITIVE ELECTRODE MATERIAL THIN FILM
摘要 Provided is a LiCoO2 sputtering target that comprises a LiCoO2 composition and that is characterized by having a resistivity of 100 Ωcm or less and a relative density of 80% or more. The sputtering target is useful for forming a positive electrode material thin film in all-solid-state thin film lithium ion secondary batteries that are mounted to automobiles or used in information communication devices, household devices, and the like.
申请公布号 WO2015146574(A1) 申请公布日期 2015.10.01
申请号 WO2015JP57004 申请日期 2015.03.10
申请人 JX NIPPON MINING & METALS CORPORATION 发明人 SATOH KAZUYUKI
分类号 C23C14/34;C23C14/08;H01M4/131;H01M4/525 主分类号 C23C14/34
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