| 摘要 |
In a substrate-processing device (1), a gas is fed, in a chamber (21), from above a shielding plate (51) into a lid interior space (231), whereby the air pressure in the lid interior space (231) becomes higher than the air pressure in the body interior space (221), and the gas in the lid interior space (231) is delivered into the body interior space (221). The gas delivered into the lid interior space (231) is suctioned by a body discharge port (226a) provided lower than a substrate (9) of the body interior space (221), and discharged from the chamber (21). A substantially cylindrical gas flow is thereby formed in the chamber (21). A processing solution is fed onto the upper surface (91) of the substrate (9) inside the substantially cylindrical gas flow; therefore, it is possible to prevent mist, fumes, etc. of the processing solution from passing through the substantially cylindrical gas flow and entering the lid interior space (231) via a gap between the shielding plate (51) and a lid bottom surface part (234). |
