发明名称 DEFECT DETECTING APPARATUS AND DEFECT DETECTING METHOD
摘要 This defect detecting apparatus detects defects in stitching, which may occur in sewn products in which threads of first and second colors are employed as stitching threads. In this defect detecting apparatus, an illumination unit (3) illuminates with first illuminating light a sewn product surface targeted for inspection. The first illuminating light has a wavelength band that is approximately identical to a wavelength band in which the reflectivity in the spectral reflectivity characteristics of the thread of the first color is low, and the reflectivity in the spectral reflectivity characteristics of the thread of the second color is higher than that of the thread of the first color. The defect detecting apparatus causes the illumination unit (3) to illuminate the sewn product with the first illuminating light, and in this state, causes an image capture section (2) to capture an image of the sewn product surface targeted for inspection, and to acquire first image data of the sewn product. The defect detecting apparatus detects defects on the basis of the first image data, or processed image data generated by carrying out image processing on the first image data.
申请公布号 WO2015146063(A1) 申请公布日期 2015.10.01
申请号 WO2015JP01457 申请日期 2015.03.17
申请人 SEIREN CO., LTD. 发明人 EBITA, TAKAO;ARAIE, HIDEMASA
分类号 G01N21/88;D05B51/00;G01N21/84 主分类号 G01N21/88
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