发明名称 ICP Emission Spectrometer
摘要 An ICP emission spectrometer is schematically configured to include an inductively coupled plasma generation unit, a light condensing unit, a spectroscope, a detector, and a controller. The detector includes a photomultiplier and has a detector controller and an input unit. The photomultiplier has voltage dividing resistors, which make an amplification factor not to become constant immediately due to a change in an application voltage applied to the photomultiplier, but the detector controller controls an idle voltage and an idle voltage application time so that a multiplication factor becomes constant, during a period from when analysis conditions are input to the input unit in advance until a sample containing an analysis-targeted element is introduced into the inductively coupled plasma generation unit.
申请公布号 US2015276611(A1) 申请公布日期 2015.10.01
申请号 US201514668480 申请日期 2015.03.25
申请人 Hitachi High-Tech Science Corporation 发明人 Nakagawa Yoshitomo
分类号 G01N21/73;G01N21/68;G01J3/443 主分类号 G01N21/73
代理机构 代理人
主权项 1. An ICP emission spectrometer comprising: an inductively coupled plasma generation unit configured to atomize or ionize an analysis-targeted element using inductively coupled plasma to obtain atomic emission lines; a light condensing unit configured to converge the atomic emission lines; a spectroscope configured to detect the atomic emission lines by diffracting light after receiving the atomic emission lines through a light incident window; a detector configured to detect the light passing through the spectroscope; a detector controller configured to control a voltage applied to the detector and an application time of the voltage; and an input unit for receiving an operation input of analysis conditions corresponding to the analysis-targeted element, wherein the detector controller is configured to control the voltage applied to the detector and the application time thereof based on an idle voltage and an idle voltage application time corresponding to an expected power amount obtained from an analysis voltage applied to the detector and an analysis voltage application time under the analysis conditions during a period from when the analysis conditions are input to the input unit until a sample containing the analysis-targeted element is introduced into the inductively coupled plasma generation unit.
地址 Tokyo JP
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