SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

摘要

A substrate processing device (1) is provided with: a chamber body (22) having an upper port (222); a chamber lid (23) having a lower port (232); and a blocking plate (51) arranged in a lid-internal space (231) of the chamber lid. A chamber (21) is formed by the upper port of the chamber body being covered by the chamber lid. In the lid-internal space, a scanning nozzle (186) that discharges processing liquid towards a substrate (9) is arranged serving as a discharge unit. A head rotating mechanism (863) selectively positions the discharge unit at a discharge position over the lower port and at a standby position radially distant from the lower port. In the lid-internal space an inert gas is supplied and gas inside is expelled. The discharge unit is positioned at the discharge position when processing liquid is supplied to the substrate, and the discharge unit is positioned in the standby position and the lower port is blocked by the blocking plate when the discharge unit is drying during the period when processing liquid is not supplied to the substrate. As a result, it is possible to efficiently dry the discharge unit.