PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD FOR PRODUCING CURED FILM, AND SEMICONDUCTOR DEVICE

摘要

Provided are: a photosensitive resin composition which enables a cyclization reaction of a heterocycle-containing polymer precursor at low temperatures, and which is capable of forming a pattern having excellent resolution; a cured film which is obtained using the photosensitive resin composition; a method for producing a cured film; and a semiconductor device. A photosensitive resin composition which contains: a compound that has a cationic moiety represented by general formula (A) and an anionic moiety having radical initiation ability; a heterocycle-containing polymer precursor; and a radically polymerizable compound. In general formula (A), Ar1 represents an aromatic group; each of R1-R5 independently represents a hydrogen atom or a monovalent organic group, and R4 and R5 may combine together to form a ring; and n represents an integer of 1 or more.