| 摘要 |
PROBLEM TO BE SOLVED: To provide exposure quipment capable of achieving transfer of a pattern onto a substrate with little defocusing, without not necessarily requiring a focus position detection system or the like.SOLUTION: In exposure equipment, a wafer and a table mounting the wafer are sandwiched by a water pressure pad and a wafer pressure pad. The water pressure pad maintains an interval between its bearing surface and the wafer in an optical axis of a projection optical system, in a predetermined dimension. The wafer pressure pad uses static pressure of an incompressible fluid (fluid) between the bearing surface and the support object (substrate), unlike a gas static pressure bering, providing a bearing having high rigidity and allowing the interval between the bearing surface and the substrate to be stably maintained constant. Liquid (for example, pure water) has higher viscosity than gas (for example, air), and is better in vibration attenuation property than gas. Accordingly, the exposure quipment achieves transfer of a pattern onto the substrate with little defocusing, without not necessarily requiring a focus position detection system or the like. |
