| 摘要 |
An Al-Te-Cu-Zr alloy sputtering target characterized by comprising 20 to 40 at% of Te, 5 to 20 at% of Cu, 5 to 15 at% of Zr and a remainder made up by Al, wherein a Te phase, a Cu phase and a CuTe phase do not exist in the target structure. The present invention addresses the problem of providing: an Al-Te-Cu-Zr alloy sputtering target which enables the effective prevention of the formation of particles, the formation of nodules and the like during sputtering, and which contains oxygen in a reduced amount; and a method for producing the Al-Te-Cu-Zr alloy sputtering target. |
