| 发明名称 |
MESOSCOPIC DEFECT DETECTION FOR RETICLE INSPECTION |
| 摘要 |
In some embodiments, a method and/or system may include detecting defects in photomasks. The method may include acquiring a first image of a first die. The method may include acquiring a second image of a second die. In some embodiments, the method may include dividing the first and the second image into a number of first and second portions respectively. The method may include reducing one or more differences in sizing of the first and the second portions. In some embodiments, the method may include determining a difference in a function derived from an image intensity between the corresponding first and second portions. The method may include summing the differences in the function between the corresponding first and second portions. The method may include detecting mesoscopic scale defects in the second die. |
| 申请公布号 |
US2015279014(A1) |
申请公布日期 |
2015.10.01 |
| 申请号 |
US201414227782 |
申请日期 |
2014.03.27 |
| 申请人 |
Shi Rui-fang;Guo Zhian;Li Bing |
发明人 |
Shi Rui-fang;Guo Zhian;Li Bing |
| 分类号 |
G06T7/00;G06K9/52 |
主分类号 |
G06T7/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of detecting defects in photomasks, comprising:
acquiring a first image of a first die; acquiring a second image of a second die; dividing the first and the second image into a number of first and second portions respectively; reducing one or more differences in sizing of the first and the second portions; determining a difference in a function derived from an image intensity between the corresponding first and second portions; summing the differences in the function between the corresponding first and second portions; and detecting mesoscopic scale defects in the second die. |
| 地址 |
Cupertino CA US |
