| 发明名称 |
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
| 摘要 |
A substrate processing apparatus according to an embodiment includes: a liquid supplier configured to supply a processing liquid to a surface of a substrate; a temperature detector configured to detect a surface temperature of the substrate supplied with the processing liquid by the liquid supplier; a temperature monitor configured to determine whether or not the surface temperature detected by the temperature detector has reached a predetermined temperature; and a controller configured to cause the liquid supplier to stop supplying the processing liquid when the temperature monitor determines that the surface temperature has reached the predetermined temperature. |
| 申请公布号 |
US2015273534(A1) |
申请公布日期 |
2015.10.01 |
| 申请号 |
US201514671278 |
申请日期 |
2015.03.27 |
| 申请人 |
SHIBAURA MECHATRONICS CORPORATION |
发明人 |
OOTAGAKI Takashi;Hayashi Konosuke;Himori Yosuke |
| 分类号 |
B08B3/08 |
主分类号 |
B08B3/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate processing apparatus comprising:
a liquid supplier configured to supply a processing liquid to a surface of a substrate; a temperature detector configured to detect a surface temperature of the substrate supplied with the processing liquid by the liquid supplier; a temperature monitor configured to determine whether or not the surface temperature detected by the temperature detector has reached a predetermined temperature; and a controller configured to cause the liquid supplier to stop supplying the processing liquid when the temperature monitor determines that the surface temperature has reached the predetermined temperature. |
| 地址 |
Yokohama-shi JP |
