发明名称 ION IMPLANTATION APPARATUS, FINAL ENERGY FILTER, AND ION IMPLANTATION METHOD
摘要 A final energy filter includes a first adjustment electrode portion, an intermediate electrode portion, and a second adjustment electrode portion. The final energy filter further includes a power supply unit. The power supply unit is configured such that it applies the voltages separately to the first adjustment electrode portion, the intermediate electrode portion, and the second adjustment electrode portion. The power supply unit applies voltages to an upstream auxiliary electrode portion, a deflection electrode portion and a downstream auxiliary electrode portion, respectively, such that the energy range of ion beam in a first region between the upstream auxiliary electrode portion and the deflection electrode portion is approximately equal to that in a second region between the deflection electrode portion and the downstream auxiliary electrode portion.
申请公布号 US2015279612(A1) 申请公布日期 2015.10.01
申请号 US201514670173 申请日期 2015.03.26
申请人 SEN Corporation 发明人 Yagita Takanori
分类号 H01J37/147;H01J37/30;H01J37/317 主分类号 H01J37/147
代理机构 代理人
主权项 1. An ion implantation apparatus comprising: an ion implantation processing chamber adapted to irradiate a workpiece with an ion beam having an intended energy; a beamline exit arranged upstream of the ion implantation processing chamber; and a final energy filter arranged between the beamline exit and the workpiece, the final energy filter comprising: a first adjustment electrode portion that adjusts a beam shape of the ion beam, the first adjustment electrode portion being arranged downstream of the beamline exit;an intermediate electrode portion that deflects the ion beam, the intermediate electrode portion being arranged downstream of the first adjustment electrode portion;a second adjustment electrode portion that adjusts the beam shape of the ion beam, the second adjustment electrode portion being arranged downstream of the intermediate electrode portion; anda power supply unit that applies voltages separately to the first adjustment electrode portion, the intermediate electrode portion and the second adjustment electrode portion, respectively, in a manner such that one of deceleration, acceleration and iso-energetic transportation of the ion beam is carried out between the first adjustment electrode portion and the intermediate electrode portion, and such that one of deceleration, acceleration and iso-energetic transportation of the ion beam is carried out between the intermediate electrode portion and the second adjustment electrode portion, wherein the intermediate electrode portion comprises: a deflection electrode portion;an upstream auxiliary electrode portion arranged between the first adjustment electrode portion and the deflection electrode portion; anda downstream auxiliary electrode portion arranged between the deflection electrode portion and the second adjustment electrode portion, wherein the power supply unit applies voltages to the upstream auxiliary electrode portion, the deflection electrode portion and the downstream auxiliary electrode portion, respectively, such that a first energy range of the ion beam in a first region between the upstream auxiliary electrode portion and the deflection electrode portion is approximately equal to a second energy range of the ion beam in a second region between the deflection electrode portion and the downstream auxiliary electrode portion.
地址 Tokyo JP