| 发明名称 |
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM FORMED USING SAID COMPOSITION, METHOD FOR FORMING PATTERN USING SAID COMPOSITION, PROCESS FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE |
| 摘要 |
An actinic-ray-sensitive or radiation-sensitive resin composition contains a compound (A) which generates acid by being irradiated with actinic rays or radiation where, when relative light absorbance is εr using triphenyl sulfonium nonaphlate as a reference and relative quantum efficiency is φr using triphenyl sulfonium nonaphlate as a reference, the relative light absorbance εr is 0.4 to 0.8 and εr×φr is 0.5 to 1.0. |
| 申请公布号 |
US2015277225(A1) |
申请公布日期 |
2015.10.01 |
| 申请号 |
US201514738953 |
申请日期 |
2015.06.15 |
| 申请人 |
FUJIFILM CORPORATION |
发明人 |
KOJIMA MASAFUMI;SHIBUYA AKINORI;GOTO AKIYOSHI;KATAOKA SHOHEI;KOSHIJIMA KOSUKE |
| 分类号 |
G03F7/004;C07D335/02;C07D333/46;C07D279/12;C07D327/06;G03F7/20 |
主分类号 |
G03F7/004 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An actinic-ray-sensitive or radiation-sensitive resin composition comprising:
a compound (A) which generates acid by being irradiated with actinic rays or radiation where, when relative light absorbance is εr using triphenyl sulfonium nonaphlate as a reference and relative quantum efficiency is φr using triphenyl sulfonium nonaphlate as a reference, the relative light absorbance εr is 0.4 to 0.8 and εr×φr is 0.5 to 1.0. |
| 地址 |
Tokyo JP |
