| 摘要 |
The present invention provides a method for manufacturing a gas barrier film, with which a gas barrier layer having improved gas barrier performance can be formed. The present invention is a method for manufacturing a gas barrier film, including a step in which, while supplying power to facing roller electrodes having a magnetic field generating device within the deposition chamber of a plasma-enhanced chemical vapor phase deposition device, plasma discharge is performed while supplying a deposition gas between the facing roller electrodes, and a gas barrier layer is deposited on a base material, wherein the temperature of the gas chamber provided to the deposition chamber is 80-300°C. |
