发明名称 Plasma electrode device and method for manufacturing the same
摘要 Provided are a plasma electrode device and a manufacturing method thereof. The plasma electrode device includes a first substrate including a first substrate main body having a first flow hole through which air flows and a first discharge electrode disposed on one surface of the first substrate main body and a second substrate disposed on one side of the first substrate, the second substrate including a second flow hole through which air flows and a second discharge electrode acting with the first substrate. The first substrate main body includes a ground electrode acting with the first or second discharge electrode to perform plasma discharge and a first insulator coupled to the ground electrode.
申请公布号 EP2923752(A1) 申请公布日期 2015.09.30
申请号 EP20150152460 申请日期 2015.01.26
申请人 LG ELECTRONICS INC. 发明人 JANG, JAESOO;SUNG, BONGJO
分类号 B01D53/32;B03C3/38;B03C3/41;F24F3/16 主分类号 B01D53/32
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