发明名称 |
SUBSTRATE PROCESSING APPARATUS AND RESIST REMOVING UNIT |
摘要 |
A substrate processing apparatus capable of inhibiting diffusion of a chemical solution atmosphere around a processing bath. The substrate processing apparatus has a processing bath for storing a substrate holder holding a substrate and for processing the substrate, a lifter configured to support the substrate holder, store the substrate holder in the processing bath, and take out the substrate holder from the processing bath, and a cover configured to cover the periphery of the substrate holder taken out from the processing bath by the lifter. |
申请公布号 |
EP2924720(A1) |
申请公布日期 |
2015.09.30 |
申请号 |
EP20150160453 |
申请日期 |
2015.03.24 |
申请人 |
EBARA CORPORATION |
发明人 |
KOBAYASHI, KENICHI;SEKIMOTO, MASAHIKO;YOKOYAMA, TOSHIO;AKAZAWA, KENICHI;KURASHINA, KEIICHI;MITSUYA, TAKASHI |
分类号 |
H01L21/67 |
主分类号 |
H01L21/67 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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