PLASMA PROCESSING EQUIPMENT, ITS OPERATION METHOD, PLASMA PROCESSING METHOD AND MANUFACTURING METHOD OF ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a technique capable of cleaning deposits inside a processing chamber by simple constitution without the need of a remote chamber or an exclusive microwave source or the like. SOLUTION: The plasma processing equipment 1 turns a prescribed gas supplied into the processing chamber 5 into plasma and executes plasma processing to a body G to be processed arranged inside the processing chamber 5 by propagating microwaves propagated to a waveguide 35 to a dielectric 46 arranged on the inner surface of the processing chamber 5. A space part 66 surrounded by a partition wall 65 composed of a dielectric material at least partially is formed inside the waveguide 35, and a cleaning gas flow path 61 for supplying a cleaning gas through the space part 66 to the processing chamber 5 is provided. COPYRIGHT: (C)2008,JPO&INPIT