发明名称 |
Gas distribution assembly for use in a semiconductor work piece processing reactor |
摘要 |
A semiconductor work piece processing reactor is described and which includes a processing chamber defining a deposition region; a pedestal which supports and moves a semiconductor work piece to be processed within the deposition region of the processing chamber; and a gas distribution assembly mounted within the processing chamber and which defines first and second reactive gas passageways which are separated from each other, and which deliver two reactant gases to a semiconductor work piece which is positioned near the gas distribution assembly.
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申请公布号 |
US2008092815(A1) |
申请公布日期 |
2008.04.24 |
申请号 |
US20060602568 |
申请日期 |
2006.11.20 |
申请人 |
ADVANCED MICRO-FABRICATION EQUIPMENT, INC. ASIA |
发明人 |
CHEN AIHUA;WANG SHULIN;HO HENRY;YIN GERALD;LV QING;FU LI |
分类号 |
C23F1/00;C23C16/00 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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