发明名称 |
Semiconductor processing apparatus and method for using same |
摘要 |
A method for using a semiconductor processing apparatus includes supplying an oxidizing gas and a reducing gas into a process container of the processing apparatus accommodating no product target substrate therein; causing the oxidizing gas and the reducing gas to react with each other within a first atmosphere that activates the oxidizing gas and the reducing gas inside the process container, thereby generating radicals; and removing a contaminant from an inner surface of the process container by use of the radicals.
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申请公布号 |
US2008093023(A1) |
申请公布日期 |
2008.04.24 |
申请号 |
US20070907820 |
申请日期 |
2007.10.17 |
申请人 |
TOMITA MASAHIKO;UMEZAWA KOTA;SON RYOU;NISHIMURA TOSHIHARU |
发明人 |
TOMITA MASAHIKO;UMEZAWA KOTA;SON RYOU;NISHIMURA TOSHIHARU |
分类号 |
H01L21/00;B08B7/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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