发明名称 VAPORIZER AND FILM FORMING APPARATUS
摘要 <p>The size of drops of liquid raw material spouted into a vaporization chamber is controlled so as to suppress any dispersion of drop size, thereby attaining assured vaporization of the drops. The vaporizer comprises raw material liquid chamber (410) into which a liquid raw material is fed at given pressure; multiple raw material spout nozzles (420) for spouting the liquid raw material stored in the raw material liquid chamber; vaporization chamber (430) for vaporizing the liquid raw material spouted from the multiple raw material spout nozzles so as to form a raw material gas; and piezoelectric device (440) for periodically changing the volume of internal space of the raw material liquid chamber so as to apply spout pressure to the liquid raw material.</p>
申请公布号 WO2008047506(A1) 申请公布日期 2008.04.24
申请号 WO2007JP65344 申请日期 2007.08.06
申请人 TOKYO ELECTRON LIMITED;MOCHIZUKI, TAKASHI 发明人 MOCHIZUKI, TAKASHI
分类号 B01D1/16;H01L21/31;C23C16/448 主分类号 B01D1/16
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