发明名称 |
VAPORIZER AND FILM FORMING APPARATUS |
摘要 |
<p>The size of drops of liquid raw material spouted into a vaporization chamber is controlled so as to suppress any dispersion of drop size, thereby attaining assured vaporization of the drops. The vaporizer comprises raw material liquid chamber (410) into which a liquid raw material is fed at given pressure; multiple raw material spout nozzles (420) for spouting the liquid raw material stored in the raw material liquid chamber; vaporization chamber (430) for vaporizing the liquid raw material spouted from the multiple raw material spout nozzles so as to form a raw material gas; and piezoelectric device (440) for periodically changing the volume of internal space of the raw material liquid chamber so as to apply spout pressure to the liquid raw material.</p> |
申请公布号 |
WO2008047506(A1) |
申请公布日期 |
2008.04.24 |
申请号 |
WO2007JP65344 |
申请日期 |
2007.08.06 |
申请人 |
TOKYO ELECTRON LIMITED;MOCHIZUKI, TAKASHI |
发明人 |
MOCHIZUKI, TAKASHI |
分类号 |
B01D1/16;H01L21/31;C23C16/448 |
主分类号 |
B01D1/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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