| 发明名称 |
METHOD FOR MANUFACTURING SILICA FILM |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a silica film from polysilazane on a base material in a short time. SOLUTION: The method for manufacturing the silica film comprises the steps of: forming a polysilazane film containing polysilazane on the base material; and irradiating the formed polysilazane film with a laser beam or a microwave to convert polysilazane into silica. COPYRIGHT: (C)2008,JPO&INPIT
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| 申请公布号 |
JP2008088031(A) |
申请公布日期 |
2008.04.17 |
| 申请号 |
JP20060272958 |
申请日期 |
2006.10.04 |
| 申请人 |
TERANAKA TOSHIO;HANAOKA KOJI;TANAKA TAKAHIRO;YAMAGUCHI MASUSHI;CONTAMINATION CONTROL SERVICE:KK |
发明人 |
TERANAKA TOSHIO;HANAOKA KOJI;TANAKA TAKAHIRO;YAMAGUCHI MASUSHI;SHINDO TOYOHIKO |
| 分类号 |
C01B33/12;A61C13/08;A61K6/087;C23C18/12 |
主分类号 |
C01B33/12 |
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