Optical arrangement for use in projection exposure apparatus used for immersion lithography has hydrophobic coating comprising ultraviolet (UV) resistant layer that absorbs and reflects UV radiation at predetermined wavelength

摘要

At least one component (1) e.g. optical element such as plano-convex lens, is applied with hydrophobic coating (6,7), which is exposed to UV radiation during operation of a projection lens. An immersion fluid wets a portion of the component during operation of the projection lens. The hydrophobic coating comprises at least one UV-resistant layer that absorbs and reflects UV radiation at a wavelength of less than 260 nanometers (nm).