发明名称 Sb-Te BASE ALLOY SINTER SPUTTERING TARGET
摘要 An antimony-tellurium base alloy sinter sputtering target comprising antimony and tellurium as major components, characterized in that it has a structure comprising antimony-tellurium base alloy particles and fine carbon or boron particles with which the alloy particles are surrounded, and that when the average diameter of the antimony-tellurium base alloy particles and the particle diameter of the carbon or boron are expressed by X and Y, respectively, then Y/X is in the range of from 1/10 to 1/10,000. The antimony-tellurium base alloy sinter sputtering target has the improved structure, is inhibited from cracking, and prevents arcing from occurring during sputtering.
申请公布号 WO2008044626(A1) 申请公布日期 2008.04.17
申请号 WO2007JP69550 申请日期 2007.10.05
申请人 NIPPON MINING & METALS CO., LTD.;YAHAGI, MASATAKA;TAKAHASHI, HIDEYUKI;AJIMA, HIROHISA 发明人 YAHAGI, MASATAKA;TAKAHASHI, HIDEYUKI;AJIMA, HIROHISA
分类号 C23C14/34;C22C28/00;G11B7/26 主分类号 C23C14/34
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