发明名称 |
Sb-Te BASE ALLOY SINTER SPUTTERING TARGET |
摘要 |
An antimony-tellurium base alloy sinter sputtering target comprising antimony and tellurium as major components, characterized in that it has a structure comprising antimony-tellurium base alloy particles and fine carbon or boron particles with which the alloy particles are surrounded, and that when the average diameter of the antimony-tellurium base alloy particles and the particle diameter of the carbon or boron are expressed by X and Y, respectively, then Y/X is in the range of from 1/10 to 1/10,000. The antimony-tellurium base alloy sinter sputtering target has the improved structure, is inhibited from cracking, and prevents arcing from occurring during sputtering. |
申请公布号 |
WO2008044626(A1) |
申请公布日期 |
2008.04.17 |
申请号 |
WO2007JP69550 |
申请日期 |
2007.10.05 |
申请人 |
NIPPON MINING & METALS CO., LTD.;YAHAGI, MASATAKA;TAKAHASHI, HIDEYUKI;AJIMA, HIROHISA |
发明人 |
YAHAGI, MASATAKA;TAKAHASHI, HIDEYUKI;AJIMA, HIROHISA |
分类号 |
C23C14/34;C22C28/00;G11B7/26 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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