RESIN MOLD FOR IMPRINT LITHOGRAPHY AND METHOD OF PREPARING THE SAME

摘要

A resin mold for imprint lithography and a manufacturing method thereof are provided to effect deformation prevention and dimensional stabilization of the resin mold even without using a rear supporter. A resin mold for imprint lithography includes: a resin mold(102a) in which an unevenness for pattern formation is formed on the one surface thereof; and a resin mold reinforcing layer(103) which is formed of a material having higher strength than the resin mold, is inserted into the resin mold in an up-down direction of the resin mold or on the upper part of the resin mold, and has at least one through part. The resin mold for imprint lithography further includes a rear supporter(104) to be attached to the other surface of the resin mold.