METHOD FOR FORMING TRANSPARENT CONDUCTIVE FILM AND TRANSPARENT CONDUCTIVE FILM SUBSTRATE

摘要

A method for forming a transparent conductive film mainly composed of titanium oxide which exhibits excellent transparency and conductivity without being restricted by a substrate. A transparent conductive film substrate is also provided. The method for forming a transparent conductive film mainly composed of titanium oxide on a substrate by plasma CVD is characterized in that a reactive gas containing at least a titanium compound, a dopant material, and a reducing gas is introduced into a discharge space and brought into a plasma state and a thin film mainly composed of titanium oxide is formed on the substrate by exposing the substrate to the reactive gas in a plasma state.