| 摘要 |
A method and a system for haze control in semiconductor processes are provided to minimize yield loss and achieve effective control of haze defects while maintaining mass production facility, by integrating reticle cleaning, reticle and wafer inspections, and control forecast software system which is based on dose and time. A method for haze control in semiconductor processes comprises the steps of: periodically performing a reticle inspection of a semiconductor reticle for sensing haze formation(306); performing wafer inspection for sensing haze defects(308); forecasting haze formation by tracking accumulated and exposed dose amount of the reticle, tracking the accumulated time required in production of the reticle, classifying the reticle as one level out of four levels, and providing the state of the reticle in visual display to a user(310); and cleaning the semiconductor reticle(312). |
