发明名称
摘要 <p>PROBLEM TO BE SOLVED: To provide an abrasion speed selection ratio improver to attain the purpose of improving the abrasion speed selection ratio of an insulating film and a stopper film stably and at a lower cost, and a method of manufacturing an abrasive liquid composition containing the abrasion speed selection ratio improver, and a method of manufacturing a substrate to be polished using the abrasive liquid composition. SOLUTION: The abrasion speed selection ratio improver comprises at least one compound selected from the group consisting of an amino acid, a compound containing a multivalent hydroxide group, and an alkylene oxide, and improves abrasion speed of an insulating film against that of a stopper film. The abrasive liquid composition contains the abrasion speed selection ratio improver, and this method of manufacturing a substrate to be polished uses the abrasive liquid composition.</p>
申请公布号 JP4063490(B2) 申请公布日期 2008.03.19
申请号 JP20000309134 申请日期 2000.10.10
申请人 发明人
分类号 C09K3/14;B24B37/00;H01L21/304 主分类号 C09K3/14
代理机构 代理人
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地址