| 摘要 |
A glass substrate-retaining member and a glass substrate continuous firing apparatus are provided to perform firing treatment of glass substrates in a suitably stood state and to solve the problem where the installation area of the whole glass substrate continuous firing apparatus becomes large. A glass substrate continuous firing apparatus performs firing treatment of a plurality of glass substrates(1) by moving a glass substrate-retaining member(10) which holds the plurality of glass substrates in a stood state, from a charge inlet(20a) toward a discharge outlet(20b) of a firing furnace(20) one by one in the firing furnace using a conveying machine(22), wherein a return device(30) for returning the glass substrate-retaining member to a direction of the charge inlet of the firing furnace in the state where a magazine base(11) and a substrate holder(12) in the glass substrate-retaining member were detached is installed at a position on or under the firing furnace. |
