| 发明名称 |
Lithographic apparatus and lithographic apparatus cleaning method |
| 摘要 |
An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.
|
| 申请公布号 |
US2008049201(A1) |
申请公布日期 |
2008.02.28 |
| 申请号 |
US20070802082 |
申请日期 |
2007.05.18 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
STAVENGA MARCO K.;JANSEN HANS;WANTEN PETER F.;LEONARDUS CUIJPERS JOHANNES W.J.;BEEREN RAYMOND G.M.;BRULS RICHARD J.;LEENDERS MARTINUS H.A.;PETRUS DE JONG ANTHONIUS M.C. |
| 分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
