发明名称 OPTICAL ILLUMINATION APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an optical illumination apparatus capable of individually illuminating two regions in predetermined illumination conditions, using two inner-reflection optical integrators juxtaposed. <P>SOLUTION: A first illumination system for illuminating a first illumination region (IR1) has a first diffraction optical element (3A) forming a desired optical strength distribution on an illumination eye, an inner-reflection first optical integrator (5A) for equalizing a light illuminating the first illumination region, and a first relay optical system (7) for allowing the first diffraction optical element and the first optical integrator to be optically conjugate. A second illumination system for illuminating a second illumination region (IR2) has a first diffraction optical element (3B) forming a desired optical strength distribution on its illumination eye, an inner-reflection second optical integrator (5B) for equalizing a light illuminating the second illumination region, and a second relay optical system (7) for allowing the second diffraction optical element and the second optical integrator to be optically conjugate. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008047744(A) 申请公布日期 2008.02.28
申请号 JP20060222906 申请日期 2006.08.18
申请人 NIKON CORP 发明人 TANAKA HIROHISA;TANITSU OSAMU
分类号 H01L21/027;G03F7/207 主分类号 H01L21/027
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