| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a micro-plasma CVD apparatus which directly deposits an inorganic substance represented by a carbon based substance such as graphite and glassy carbon, on the surface of various substrate materials in a simple process, under reduced pressure or pressurization, without particularly heating the substrate, in the region of a micrometer order without using a mask or the like. <P>SOLUTION: The micro-plasma CVD apparatus is composed of: cylindrical plasma torch 5 of an insulating material; a plasma gas supply system 1; a high frequency power source for generating plasma 9; a matching box 10, an igniter for turning on plasma 8; an atmospheric gas blowing nozzle 2; and a triaxial manipulator 14 for controlling the position of a deposit substrate. For the purpose of depositing a carbon nano tube material on the substrate 11, a hydrocarbon gas such as methane is simply mixed in a plasma gas represented by an inert gas such as argon, and is then supplied to a plasma nozzle. This process can be performed under the atmospheric pressure and under conditions of reduced pressure or high pressure. <P>COPYRIGHT: (C)2008,JPO&INPIT |
