INORGANIC RESIST PATTERN, METHOD FOR FORMING SAME, OPTICAL MASTER DISK, METHOD FOR MANUFACTURING SAME, METHOD FOR MANUFACTURING OPTICAL DISK STAMPER AND METHOD FOR MANUFACTURING OPTICAL DISK SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To suppress the formation of a crystalline interfacial layer between an inorganic resist layer and a substrate or a layer under the resist layer.

SOLUTION: A method for forming an inorganic resist pattern includes: a step of forming an inorganic resist layer 3 comprising a metal oxide above a substrate 1; a step of irradiating the inorganic resist layer 3 with laser light 3b to form a latent image 3a of a predetermined shape; and a step of developing the inorganic resist layer 3 to form a raised and recessed pattern of the inorganic resist layer 3 in which the latent image 3a forming portion is recessed above the substrate 1, wherein formation of a crystalline interfacial layer between the inorganic resist layer 3 and the substrate 1 or a layer 2 under the resist layer 3 is suppressed by using a metal oxide comprising a single transition metal as the above metal oxide.

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