| 摘要 |
PROBLEM TO BE SOLVED: To provide a polymer capable of exhibiting performances according to design in the objective uses, to provide a method for producing the polymer and to provide a resist composition enabling a resist film to exhibit the performances according to the design and the development of defects to be suppressed in a resist pattern. SOLUTION: The method for producing the polymer comprises a step of filtering a dispersion of the polymer and producing wet powder of the polymer and a step of introducing the wet powder of the polymer into a vessel 52 and drying the wet powder. A vessel having≤1.8μS/cm difference (X-Y) between the electroconductivity (X) of water after dipping the vessel and the electrocoductivity (Y) of water before dipping the vessel is used as the vessel 52. Pure water having≤0.5μS/cm electroconductivity is used as the water before dipping the vessel and the electrocoductivity (X) of the water after dipping the vessel is the electroconductivity of the water measured in such a state in which the vessel is dipped in the pure water in a volume of 20 L based on 1 m<SP>2</SP>inner area of the vessel after 15 min from the start of the dipping. COPYRIGHT: (C)2008,JPO&INPIT |
