A method of cleaning a diffraction grating preferably includes exposing the grating surface to an aqueous base to remove an organic photoresist mask thereon; rinsing the grating surface with de-ionized water; oxidizing acid solution (such as Nanostrip or Nanostrip 2X) to remove metallic contaminants and residue organic compounds; rinsing the grating surface with de-ionized water; exposing the grating surface to an oxygen plasma ashing process using reactive oxygen species to oxidize and remove fluorinated hydrocarbon residue; exposing the grating surface again to an oxidizing acid solution to remove metallic contaminants and residue organic compounds; and rinsing the grating surface with de-ionized water.
申请公布号
WO2008024480(A2)
申请公布日期
2008.02.28
申请号
WO2007US18763
申请日期
2007.08.23
申请人
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA;BRITTEN, JERALD, A.;NGUYEN, HOANG, T.